High Aspect Ratio Silicon Nanohole Arrays via Electric-Field-Incorporated Metal-Assisted Chemical Etching
- Journal
- ACS Appl. Mater. Interfaces 2025, 17, 21, 31212–31220
- Year
- 2025
- highlight
- Highlighted on Supplementary Cover
- Link
- https://doi.org/10.1021/acsami.5c00564 34회 연결