목록 관리 검색 Plasma doping technology for fabrication of nanoscale metal-oxide-semiconductor transistor Author W.-j. Cho*, K. Im, C.-G. Ahn, J.-H. Yang, J. Oh, I.-B.Baek, and S. Lee Co-author Journal of Vacuum Science and Technology B 22, 3210 (2004) Year 2004 Link https://doi.org/10.1116/1.1813461 395회 연결 Journal of Vacuum Science and Technology B 22, 3210 (2004)
