"Single and multiple dip-coating process of colloidal maghemite (γ-Fe2O3) nanoparticles on various substrates (Si, Si3N4, and SiO2)"

T.-S. Yoon, J. Oh, S.-H. Park, V. Kim, B.G. Jung, S.-H. Min, J. Park, T. Hyeon, and K.-B. Kim* , Advanced Functional Materials 14, 1062 (2004)

"Ultra shallow and abrupt n+-p junction formations on Silicon-on-Insulator by solid phase diffusion of Arsenic from spin-on-dopant for sub 50 nm Si metal-oxide-semiconductor devices"

J. Oh*, K. Im, C.-G. Ahn, J.-H. Yang, W.-j. Cho, S. Lee, and K. Park , Materials Science and Engineering B 110, 185 (2004)

"Fabrication of 50 nm-gate SOI n-MOSFETs using Novel Plasma Doping Technique"

W.-j. Cho, C.-G. Ahn, K. Im, J.-H. Yang, J. Oh, I.-B. Baek, and S. Lee , IEEE Electron Device Letters 25, 366 (2004)

"Plasma doping technology for fabrication of nanoscale metal-oxide-semiconductor transistor"

W.-j. Cho*, K. Im, C.-G. Ahn, J.-H. Yang, J. Oh, I.-B.Baek, and S. Lee , Journal of Vacuum Science and Technology B 22, 3210 (2004)

"Fabrication of 50nm tri-gate SOI MOSFET without source/drain activation annealing"

K. Im*, W.-j. Cho, C.-G. Ahn, Y.-H. Yang, J. Oh, and S. Lee , Japanese Journal of Applied Physics 43, 2438 (2004)

"Characteristics of solid-phase diffused ultra-shallow junction using phosphorus doped silicon oxide films for fabrication of sub-100 nm SOI MOSFET"

W.-j. Cho*, K. Im, J.-H. Yang, J. Oh, S. Lee, and K. Park , Journal of Materials Science 39, 1829 (2004)

"Defect-free ultra shallow source/drain extension using spin-on-dopants for deep submicron SOI MOSFET applications"

Y.-H. Yang*, J. Oh, W.-j. Cho, S. Lee, K. Im, and K. Park , Journal of the Korean Physics Society 44, 423 (2004)