Publication

the Laboratory for Energy and Sustainability

Journals

Journals

Fabrication of 50 nm-gate SOI n-MOSFETs using Novel Plasma Doping Technique
Author
W.-j. Cho, C.-G. Ahn, K. Im, J.-H. Yang, J. Oh, I.-B. Baek, and S. Lee
Co-author
IEEE Electron Device Letters 25, 366 (2004)
Year
2004
IEEE Electron Device Letters 25, 366 (2004)