"Antireflection and SiO2 surface passivation by liquid-phase chemistry for efficient black silicon solar cells"

H.-C. Yuan, J. Oh, Y. Zhang, O.A. Kuznetsov, D.J. Flood, and H.M. Branz , Proceedings of 38th IEEE Photovoltaic Specialists Conference, to appear (#187), (2012).

"An 18.2%-efficient black silicon solar cell achieved through control of carrier recombination"

J. Oh*, H.-C. Yuan, and H.M. Branz , Nature Nanotechnology 7, 743 (2012)

"Nanoporous black silicon photocathode for H2 production by photoelectrochemical water splitting"

J. Oh*, T.G. Deutsch, H.-C. Yuan, and H.M. Branz , Energy and Environmental Science 4, 1690 (2011)

"The role of electric field in pore formation during aluminum"

J. Oh, and C.V. Thompson* , Electrochimica Acta 56, 4044 (2011)

"Abnormal anodic aluminum oxide formation in confined structures for lateral pore arrays"

J. Oh, and C.V. Thompson* , Journal of the Electrochemical Society, 158, C71 (2011)

"A tungsten interlayer process for fabrication of through-pore AAO scaffolds on gold substrates"

J. Oh, Y.C. Shin, and C.V. Thompson* , Journal of the Electrochemical Society 158, K11 (2011).

"Fabrication of silicon nanopillar-based nanocapacitor arrays"

S. Chang, J. Oh, S.T. Boles, and C.V. Thompson* , Applied Physics Letters 96, 153108 (2010)

"Selective barrier perforation in porous alumina anodized on substrates"

J. Oh, and C.V. Thompson* , Advanced Materials 20, 1368 (2008)

"Tuning of vertically-aligned carbon nanotube diameter and areal density through catalyst pre-treatment"

G.D. Nessim, A.J. Hart, J.S. Kim, D. Acquaviva, J. Oh, C.D. Morgan, M. Seita, J.S. Leib, and C.V. Thompson* , Nano Letters 8, 3587 (2008)

"Single and multiple dip-coating process of colloidal maghemite (γ-Fe2O3) nanoparticles on various substrates (Si, Si3N4, and SiO2)"

T.-S. Yoon, J. Oh, S.-H. Park, V. Kim, B.G. Jung, S.-H. Min, J. Park, T. Hyeon, and K.-B. Kim* , Advanced Functional Materials 14, 1062 (2004)

"Ultra shallow and abrupt n+-p junction formations on Silicon-on-Insulator by solid phase diffusion of Arsenic from spin-on-dopant for sub 50 nm Si metal-oxide-semiconductor devices"

J. Oh*, K. Im, C.-G. Ahn, J.-H. Yang, W.-j. Cho, S. Lee, and K. Park , Materials Science and Engineering B 110, 185 (2004)

"Fabrication of 50 nm-gate SOI n-MOSFETs using Novel Plasma Doping Technique"

W.-j. Cho, C.-G. Ahn, K. Im, J.-H. Yang, J. Oh, I.-B. Baek, and S. Lee , IEEE Electron Device Letters 25, 366 (2004)

"Plasma doping technology for fabrication of nanoscale metal-oxide-semiconductor transistor"

W.-j. Cho*, K. Im, C.-G. Ahn, J.-H. Yang, J. Oh, I.-B.Baek, and S. Lee , Journal of Vacuum Science and Technology B 22, 3210 (2004)

"Fabrication of 50nm tri-gate SOI MOSFET without source/drain activation annealing"

K. Im*, W.-j. Cho, C.-G. Ahn, Y.-H. Yang, J. Oh, and S. Lee , Japanese Journal of Applied Physics 43, 2438 (2004)

"Characteristics of solid-phase diffused ultra-shallow junction using phosphorus doped silicon oxide films for fabrication of sub-100 nm SOI MOSFET"

W.-j. Cho*, K. Im, J.-H. Yang, J. Oh, S. Lee, and K. Park , Journal of Materials Science 39, 1829 (2004)